Photoresist Monomer
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Monomers used to synthesize photoresists are important materials in lithography for microelectronics manufacturing.
Photoresist Monomer
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In-stock：
Functional group：
Monofunctional group
Bifunctional group
Trifunctional group
Skeleton：
Inventory Status：
Chirality：
Purity：
Rule of 5：
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In-stockPurity: ≥97%
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In-stockPurity: ≥98%
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In-stockPurity: ≥97%
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In-stockPurity: ≥98%
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In-stockPurity: ≥97%
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In-stockPurity: ≥96%
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In-stockPurity: ≥96%
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In-stockPurity: ≥98%
Cat. No. : CS-0158714 -
In-stockPurity: ≥98%
Cat. No. : CS-0167374 -
In-stockPurity: ≥98%
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